Negative-working photosensitive siloxane composition

ABSTRACT

[Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. 
     [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having an ureido bond, a polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, and developed, so that a cured film can be obtained without carrying out post-exposure baking.

TECHNICAL FIELD

The present invention relates to a negative-working photosensitivesiloxane composition. Further, this invention also relates to a curedfilm-manufacturing method employing the composition, a cured film formedfrom the composition, and a device comprising the cured film.

BACKGROUND ART

In the field of optical devices, such as, displays, light emittingdiodes and solar cells, various proposals have been recently made forthe purposes of energy conservation and of improvement in lightutilization efficiency. For example, there is a known method forincreasing the aperture ratio of a liquid crystal display. In thatmethod, a transparent planarization film is formed to cover a thin-filmtransistor (hereinafter, often referred to as “TFT”) element and thenpixel electrodes are formed on the planarization film (see, Patentdocument 1). Similarly to this method for a liquid crystal display,there is also a method proposed in order to increase the aperture ratioof an organic electric field light-emitting device (hereinafter, oftenreferred to as “organic EL device”). In the proposed method, theconstitution of the device is changed from a type in which alight-emitting layer is formed by deposition on transparent pixelelectrodes provided on a substrate so that the emitted light isextracted from the substrate side (i.e., bottom emission type) toanother type in which a TFT element, a planarization film formed thereonto cover the TFT element, transparent pixel electrodes provided thereon,and a light-emitting layer formed thereon are so laminated that thelight given off from the light-emitting layer is extracted from the sideopposite to the TFT element (i.e., top emission type) (see, Patentdocument 2).

According as new technologies such as 3D displaying have been introducedto meet increasing needs for improvement of displays in resolution, inupsizing and in image quality, signal delay on the wiring has beenbecoming a problem. Specifically, the speed of rewriting imageinformation (i.e., frame frequency) has been accelerated, andaccordingly the input time of signals into the TFT element has beenshortened. However, even if it is attempted to improve the responsespeed by broadening the wiring width to reduce the wiring resistance,the broadening of the wiring width is limited by the requirements ofhigh resolution displaying and the like. In view of that, it is proposedto increase the wiring thickness so as to solve the problem of signaldelay (see, Non-patent document 1).

As one of the materials for the planarization film formed on a TFTsubstrate, it is known to adopt a negative-working photosensitivecomposition mainly comprising a polysiloxane compound and apolymerization initiator. The polysiloxane compound is obtained bypolymerization of a bifunctional group-containing silane compound, suchas, dialkyldialkoxysilane, in the presence of catalysis. The compositionis generally coat on a substrate to form a coating, which is thenexposed to light, developed and heated to produce a planarization film.During the exposure to light, the composition undergoes polymerizationreaction to cure but is not completely cured. It is, therefore, generalthat the coating is further heated after exposed to light so as topromote the polymerization reaction (post-exposure baking step) andthereafter developed. However, in view of the production efficiency, theabove process is disadvantageous because it requires the heating stepand consumes costly energy for heating.

PRIOR ART DOCUMENTS Patent Documents

-   [Patent document 1] Japanese Patent No. 2933879-   [Patent document 2] Japanese Patent Laid-Open No. 2006-236839-   [Patent document 3] Re-publication of PCT International Publication    No. 2006-073021-   [Patent document 4] Japanese Patent Laid-Open No. 2011-190333

Non-Patent Documents

-   [Non-patent document 1] IMID/IDMC/ASIA DISPLAY 2008 Digest (pp.    9-pp. 12)

DISCLOSURE OF INVENTION Problem to be Solved by the Invention

In consideration of the above, it has been desired to provide anegative-working photosensitive siloxane composition which is superiorto conventional ones both in sensitivity and in resolution, which formsa cured film better than conventional ones in optical or physicalcharacteristics and which does not need post-exposure baking inproducing the cured film.

Means for Solving Problem

The present invention provides a negative-working photosensitivesiloxane composition, comprising

a polysiloxane,a silicon-containing compound having an ureido bond,a photo-polymerization initiator, anda solvent.

The present invention also provides a cured film-manufacturing methodcomprising the steps of: coating on a substrate the abovenegative-working photosensitive siloxane composition, to form a coating;exposing the coating to light; and developing the exposed coating.

The present invention further provides a cured film formed from theabove negative-working photosensitive siloxane composition.

The present invention furthermore provides a device comprising the abovecured film.

Effect of the Invention

The negative-working photosensitive siloxane composition provided by thepresent invention makes it possible to form a cured film withoutcarrying out a step of heating for curing the exposed compositioncoating (post-exposure baking step). A photosensitive layer formed fromthe composition has high sensitivity and high resolution, and also acured film formed from the composition is excellent in transparency, inheat resistance, in chemical resistance and in environmental durability.This cured film can achieve excellent characteristics when used in aplanarization film provided on a thin-film transistor (TFT) substrateadopted as a backplane of a display, such as, a liquid crystal displayor an organic EL display; when used in an interlayer insulating film ina semiconductor element; or when used in an optical device, such as, asolid-state image sensor, an anti-reflective film, an anti-reflectiveplate, an optical filter, a superluminescent light-emitting diode, atouch panel, a solar cell or an optical waveguide.

BEST MODE FOR CARRYING OUT THE INVENTION

Embodiments of the present invention will be described below in detail.

Negative-Working Photosensitive Siloxane Composition

The negative-working photosensitive siloxane composition of the presentinvention comprises a polysiloxane, a silicon-containing compound havingan ureido bond, a photo-polymerization initiator and a solvent. Thefollowing will explain, in order, the polysiloxane, thesilicon-containing compound, the photo-polymerization initiator and thesolvent used in the composition of the present invention.

(I) polysiloxane

The composition according to the present invention contains apolysiloxane as a main component. The term “polysiloxane” means apolymer having Si—O—Si bonds, and it means not only an unsubstitutedinorganic polysiloxane but also an organic group-substituted organicpolysiloxane in the present invention. The polysiloxane compoundgenerally has silanol groups or alkoxysilyl groups. The terms “silanolgroups” and “alkoxysilyl groups” mean hydroxyl groups and alkoxy groups,respectively, which directly connect to silicon atoms constituting thesiloxane skeleton. Those groups have a function of promoting a curingreaction when a cured film is formed from the composition, and also arethought to contribute to the later-described reaction with thesilicon-containing compound. Accordingly, the polysiloxane compoundpreferably has those groups.

The polysiloxane used in the present invention is not particularlyrestricted on its structure, and can be freely selected in accordancewith the aimed applications. According to the number of oxygen atomsconnecting to a silicon atom, the structure of polysiloxane can begenerally categorized into the following three skeletons, that is:silicone skeleton (in which two oxygen atoms connect to a silicon atom),silsesquioxane skeleton (in which three oxygen atoms connect to asilicon atom), and silica skeleton (in which four oxygen atoms connectto a silicon atom). In the present invention, the polysiloxane may haveany of those skeletons. Further, the structure of the polysiloxanemolecular may be a combination of two or more of them.

In the case where an organic polysiloxane is adopted, substituent groupscontained therein can be freely selected unless they impair the effectof the present invention. The substituent groups are, for example,groups having no Si—O bonds, which constitute the siloxane structure.Examples thereof include alkyl groups, alkenyl groups, hydroxyalkylgroups, and aryl groups.

The siloxane resin may have reactive groups other than the silanol oralkoxysilyl groups, such as, carboxyl groups, sulfonyl groups, and aminogroups, unless they impair the effect of the present invention. However,those reactive groups generally tend to lower the storage stability ofthe composition, and hence they are preferably contained in a smallamount. Specifically, the amount thereof is preferably 10 mol % or lessbased on the total number of hydrogen atoms or substituent groupsconnecting to silicon atoms. Further, it is particularly preferred forthe resin not to contain those reactive groups at all.

It is for the purpose of forming a cured film that the composition ofthe present invention is coat on a substrate, imagewise exposed to lightand then developed. This means that there must be a difference insolubility between the exposed area and the unexposed area. In thepresent invention, the exposed area undergoes a curing reaction to beinsoluble in a developer and thereby to form an image. Accordingly, thepolysiloxane in the unexposed area should be soluble in a developer morethan a certain degree. For example, if the formed coating has adissolution rate of 50 Å/second or more in a 2.38% aqueous solution oftetramethylammonium hydroxide (hereinafter often referred to as “TMAH”),it is thought to be possible to produce a negative pattern byexposure-development procedure. However, the polysiloxane must beproperly selected according to the development conditions because therequired solubility depends on those conditions.

If a polysiloxane having a high dissolution rate is simply selected touse, problems may arise in that the pattern shape may be deformed, inthat the area of remaining coating may be decreased and in that thetransparency may be reduced. In order to cope with those problems, it ispossible to adopt a polysiloxane mixture containing a polysiloxanehaving a low dissolution rate.

The polysiloxane mixture, for example, comprises

(Ia) a first polysiloxane the coating of which after prebaked is solublein a 5 wt % aqueous solution of tetramethylammonium hydroxide at adissolution rate of 3000 Å/second or less, and(Ib) another polysiloxane the coating of which after prebaked has adissolution rate of 150 Å/second or more in a 2.38 wt % aqueous solutionof tetramethylammonium hydroxide. Those polysiloxane compounds will beexplained below.

(a) First Polysiloxane

The coating of the first polysiloxane (Ia) after prebaked is soluble ina 5 wt % aqueous solution of tetramethylammonium hydroxide, and thedissolution rate thereof is 3000 Å/second or less, preferably 2000Å/second or less. This polysiloxane by itself is slightly soluble in a2.38% TMAH aqueous solution.

The first polysiloxane can be produced by hydrolyzing in the presence ofbasic catalysis and condensing a silane compound (ia) selected from thegroup consisting of trialkoxysilanes and tetraalkoxysilanes.

The silane compound (ia) as a starting material may be any one selectedfrom the group consisting of trialkoxysilanes and tetraalkoxysilanes.For example, it can be represented by the following formula (i):

R¹ _(n)Si(OR²)_(4-n)  (i)

in which R¹ is a straight, branched or cyclic alkyl group of 1 to 20carbon atoms in which any methylene may be replaced with oxygen orotherwise is an aryl group of 6 to 20 carbon atoms in which any hydrogenmay be replaced with fluorine; n is 0 or 1; and R² is an alkyl group of1 to 5 carbon atoms.

Examples of R¹ in the formula (i) include methyl, ethyl, n-propyl,iso-propyl, t-butyl, n-hexyl, n-decyl, trifluoromethyl,2,2,2-trifluoroethyl, 3,3,3-trifluoropropyl, cyclohexyl, phenyl, tollyland naphthyl groups. The compound having a methyl group as R¹ isparticularly preferred because that material is easily available and theresultant cured film has sufficient hardness and high chemicalresistance. Also preferred is a phenyl group because it enhancessolubility of the polysiloxane in the solvent and makes the resultantcured film hardly suffer from cracking.

Examples of R² in the formula (i) include methyl, ethyl, n-propyl,iso-propyl, and n-butyl groups. The formula (i) has two or more R²s,which may be the same or different from each other.

Concrete examples of the trialkoxysilane compounds represented by theformula (i) include methyltrimethoxysilane, methyltriethoxysilane,methyltriisopropoxysilane, methyltri-n-butoxysilane,ethyltrimethoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane,ethyltri-n-butoxysilane, n-propyltrimethoxysilane,n-propyltriethoxysilane, n-butyltrimethoxysilane,n-butyltriethoxysilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane,decyltrimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane,naphthyltrimethoxysilane, naphthyltriethoxysilane,naphthyltriisopropoxysilane, naphthyltri-n-butoxysilane,trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, and3,3,3-trifluoropropyltrimethoxysilane. Among them, preferred aremethyltrimethoxysilane, methyltriethoxysilane, phenyltrimethoxysilaneand phenyltriethoxysilane because they are easily available.

Further, concrete examples of the tetraalkoxysilane compoundsrepresented by the formula (i) include tetramethoxysilane,tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane. Amongthem, preferred are tetramethoxysilane and tetraethoxysilane becausethey have high reactivity.

For synthesis of the first polysiloxane (Ia), the silane compound (ia)may be used singly or in combination of two or more. Iftetraalkoxysilanes are adopted as the silane compound (ia), they tend toreduce heat collapsing of the pattern. This is thought to be because thecrosslinking density increases in the polysiloxane. However, iftetraalkoxysilanes are used too much, the sensitivity may be lowered. Inview of that, if tetraalkoxysilanes are employed as a material of thepolysiloxane (Ia), the amount thereof is preferably 0.1 to 40 mol %,more preferably 1 to 20 mol %, based on the total molar amount of thetrialkoxysilane and tetraalkoxysilane compounds.

The polysiloxane (Ia) used in the present invention is preferablyproduced by hydrolyzing in the presence of basic catalysis andcondensing the above silane compound.

For example, it can be produced by the steps of: dropping the silanecompound or a mixture thereof into a reaction solvent comprising anorganic solvent, basic catalysis and water, so as to conduct hydrolysisand condensation reactions; purifying by neutralizing or by washing orcondensing the reaction solution, if necessary; and replacing thereaction solvent with a desired organic solvent, if necessary.

Examples of the organic solvent adoptable as the reaction solventinclude: hydrocarbons, such as, hexane, toluene, xylene and benzene;ethers, such as, diethyl ether and tetrahydrofuran; esters, such as,ethyl acetate and propylene glycol monomethylethylacetate; alcohols,such as, methanol, ethanol, iso-propanol, butanol and 1,3-dipropanol;and ketones, such as, acetone, methyl ethyl ketone and methyl isobutylketone. Those organic solvents can be employed singly or in combination.The amount of the organic solvent is generally 0.1 to 10 times,preferably 0.5 to 2 times the weight of the mixture of the silanecompound.

The temperature at which the hydrolysis and condensation reactions areconducted is generally 0 to 200° C., preferably 10 to 60° C. Thetemperature of the dropped silane compound may be the same as ordifferent from that of the reaction solvent. The reaction time dependson the kind of the silane compound and the like, but is normally severaltens of minutes to several tens of hours, preferably 30 minutes or more.Various conditions of the hydrolysis and condensation reactions, suchas, the amount of the basic catalysis, the reaction temperature and thereaction time, are properly selected in consideration of the reactionscale and the size and shape of the reaction vessel, so as to obtaincharacteristics suitable for the aimed use.

Examples of the basic catalysis include: organic bases, such as,triethylamine, tripropylamine, tributylamine, tripentylamine,trihexylamine, triheptylamine, trioctylamine, diethylamine,triethanolamine, diethanolamine, and alkoxysilane having amino group;inorganic bases, such as, sodium hydroxide and potassium hydroxide;anion exchange resin; and tertiary ammonium salts, such as,tetrabutylammonium hydroxide, tetraethylammonium hydroxide, andtetramethylammonium hydroxide. The amount of the catalysis is preferably0.0001 to 10 times the mole of the mixture of the silane compound. Thepolysiloxane synthesized by use of the basic catalysis is characterizedin that it rapidly begins to cure when heated at 150° C. or more and inthat the pattern thereof can keep the shape clearly even after beingcured without suffering from heat collapsing.

The degree of the hydrolysis can be controlled by how much water isadded to the reaction solvent. It is generally preferred to makehydrolytic alkoxy groups in the silane compound react with water in anamount of 0.01 to 10 times, preferably 0.1 to 5 times the mole of thegroups. If the added amount of water is smaller than the above, thehydrolysis degree is too low to form a coating of the composition. Thatis unfavorable. On the other hand, however, if it is too much, thecomposition easily undergoes gelation and hence has low storagestability. That is unfavorable, too. The water is preferably ionexchange water or distilled water.

After the reactions are completed, the reaction solution may be madeneutral or weakly acidic by use of an acidic compound as a neutralizer.Examples of the acidic compound include: inorganic acids, such as,phosphoric acid, nitric acid, sulfuric acid, hydrochloric acid andhydrofluoric acid; and organic acids, such as, acetic acid,trifluoroacetic acid, formic acid, lactic acid, acrylic acid,multivalent carboxylic acids (e.g., oxalic acid, maleic acid, succinicacid, citric acid) and anhydrides thereof, and sulfonic acids (e.g.,p-toluenesulfonic acid and methanesulfonic acid). Further, cationexchange resin can be used as a neutralizer.

The amount of the neutralizer is properly selected according to pH ofthe reaction solution after the reactions, but is preferably 0.5 to 1.5times, more preferably 1 to 1.1 times the mole of the basic catalysis.In the case where cation exchange resin is adopted, the number of ionicgroups in the exchange resin is preferably in the above range.

According to necessity, the reaction solution after neutralized can bewashed and purified. There are no particular restrictions on the way ofwashing. For example, hydrophobic organic solvent and water, ifnecessary, are added to the reaction solution after neutralized, andthen the mixture was stirred and thereby the organic solvent is broughtinto contact with the polysiloxane so as to dissolve at least thepolysiloxane (Ia) in the hydrophobic organic solvent phase. As thehydrophobic organic solvent, a compound capable of dissolving thepolysiloxane (Ia) but immiscible with water is employed. Here, thecompound “immiscible with water” means that, even if water and thecompound are well mixed, the mixture separates into an aqueous phase andan organic phase while left to stand.

Preferred examples of the hydrophobic organic solvent include: ethers,such as, diethyl ether; esters, such as, ethyl acetate; alcohols havinglow solubility in water, such as, butanol; ketones, such as, methylethyl ketone and methyl isobutyl ketone; and aromatic solvents, such as,toluene and xylene. The hydrophobic organic solvent used in washing maybe the same as or different from the organic solvent used as thereaction solvent, and further two or more solvents may be mixed to use.In this washing step, most of the basic catalysis used in the reactions,the neutralizer, salts formed by the neutralization, and by-products ofthe reactions, such as, alcohols and water, are contained in the aqueousphase and hence essentially removed from the organic phase. The times ofwashing can be changed according to necessity.

The temperature in washing is not particularly restricted, but ispreferably 0 to 70° C., more preferably 10 to 60° C. The temperature atwhich the aqueous phase and the organic phase are separated is also notparticularly restricted, but is preferably 0 to 70° C., more preferably10 to 60° C. in view of shorting the time for separating the phases.

The above washing step may improve the composition in coatability and instorage stability.

The reaction solution after washed may be directly added to thecomposition of the present invention, but can be condensed, ifnecessary, to remove the solvent and remaining by-products, such as,alcohols and water, and thereby to change the concentration. Further,the solvent may be replaced with another solvent. The solution can becondensed under normal (atmospheric) pressure or reduced pressure, andthe degree of condensation can be freely changed by controlling thedistilled amount. The temperature in the condensation step is generally30 to 150° C., preferably 40 to 100° C. According to the aimed solventcomposition, a desired solvent may be added and then the solution may befurther condensed to replace the solvent.

In the above manner, the polysiloxane (Ia) usable in the siloxane resincomposition of the present invention can be produced.

(b) Second Polysiloxane

The coating of the second polysiloxane after prebaked is soluble in a2.38 wt % aqueous solution of tetramethylammonium hydroxide, and thedissolution rate thereof is 150 Å/second or more, preferably 500Å/second or more.

This polysiloxane (Ib) can be produced by hydrolyzing in the presence ofacidic or basic catalysis and condensing a silane compound (ib) selectedfrom the group consisting of trialkoxysilanes and tetraalkoxysilanes.

The conditions of the above production process may be the same as thosefor the polysiloxane (Ia). However, acidic catalysis as well as basiccatalysis can be employed as the reaction catalysis. In order to realizethe aimed dissolution rate, the conditions, such as, the reactionsolvent, particularly, the amount of added water, the reaction time, andthe reaction temperature, are properly controlled.

The silane compound (ib) may be the same as or different from the silanecompound (la), which is used as a material of the polysiloxane (Ia). Iftetraalkoxysilanes are adopted as the silane compound (ib), they tend toreduce heat collapsing of the pattern.

If a relatively large amount of tetraalkoxysilane is used as a materialof the first polysiloxane (Ia), it is preferred to use a small amount oftetraalkoxysilane as a material of the second polysiloxane (Ib). That isbecause, if containing a large amount of tetraalkoxysilane in total, theformed coating often suffers from deposition of the silane compound orfrom deterioration of sensitivity. Accordingly, the amount oftetraalkoxysilane is preferably 1 to 40 mol %, more preferably 1 to 20mol %, based on the total molar amount of the silane compounds (ia) and(ib), which are materials of the polysiloxanes (Ia) and (Ib),respectively.

In producing the polysiloxane (Ib), acidic catalysis can be used as thereaction catalysis. Examples of the acidic catalysis includehydrochloric acid, nitric acid, sulfuric acid, hydrofluoric acid,phosphoric acid, acetic acid, trifluoroacetic acid, formic acid, andmultivalent carboxylic acids and anhydrides thereof. The amount of thecatalysis depends on the strength of the acid, but is preferably 0.0001to 10 times the mole of the mixture of the silane compound.

In the case where the acidic catalysis is adopted to produce thepolysiloxane (Ib), the reaction solution may be neutralized after thereactions are completed in the same manner as in the case where thebasic catalysis is adopted. In this case, basic compounds are employedas the neutralizer. Examples of the basic compounds used forneutralization include: organic bases, such as, triethylamine,tripropylamine, tributylamine, tripentylamine, trihexylamine,triheptylamine, trioctylamine, diethylamine, triethanolamine, anddiethanolamine; inorganic bases, such as, sodium hydroxide and potassiumhydroxide; and tertiary ammonium salts, such as, tetrabutylammoniumhydroxide, tetraethylammonium hydroxide, and tetramethylammoniumhydroxide. In addition, anion exchange resin is also employable. Theamount of the neutralizer may be the same as that in the case where thebasic catalysis is adopted. Specifically, that is properly selectedaccording to pH of the reaction solution after the reactions, but ispreferably 0.5 to 1.5 times, more preferably 1 to 1.1 times the mole ofthe acidic catalysis.

In the above manner, the polysiloxane (Ib) usable in the siloxane resincomposition of the present invention can be produced.

As described later, the polysiloxane (Ib) has a rate of dissolution in a2.38 wt % TMAH aqueous solution necessarily in the range of 150 Å/secondor more, preferably in the range of 500 Å/second or more. If thepolysiloxane (Ib) has a dissolution rate of less than 150 Å/second in a2.38 wt % TMAH aqueous solution, it is necessary to reduce the amount ofthe polysiloxane (Ia), which is slightly soluble, as much as possible inorder that the mixture of the polysiloxanes (Ia) and (Ib) can have arate of dissolution in a 2.38 wt % TMAH aqueous solution in the range of50 to 3000 Å/second. However, if the polysiloxane (Ia) is contained in asmall amount, it is difficult to prevent heat collapsing of the pattern.

(c) Polysiloxane Mixture (I)

In the present invention, a polysiloxane mixture (I) containing theabove polysiloxanes (Ia) and (Ib) can be used. There are no particularrestrictions on the mixing ratio of the polysiloxanes (Ia) and (Ib), butthe weight ratio of the polysiloxanes (Ia)/(Ib) is preferably 1/99 to80/20, more preferably 20/80 to 50/50 in the polysiloxane mixture (I).

If the polysiloxane (Ia) has a dissolution rate of 3000 Å/second or lessin a 5 wt % TMAH aqueous solution and also if the polysiloxane (Ib) hasa dissolution rate of 150 Å/second or more in a 2.38 wt % TMAH aqueoussolution, serious problems of insufficient dissolution and ofsensitivity deterioration can be avoided. However, it is possible toproperly select the dissolution rate of the polysiloxane mixture (I) ina 2.38 wt % TMAH aqueous solution according to the thickness anddeveloping time of the cured film formed from the negative-workingphotosensitive siloxane composition of the present invention. Thedissolution rate of the polysiloxane mixture (I) can be controlled bychanging the mixing ratio of the polysiloxanes (Ia) and (Ib). Althoughdepending on the kind and amount of the photosensitive materialcontained in the negative-working photosensitive siloxane composition,the dissolution rate of the polysiloxane mixture (I) is, for example,preferably 50 to 3000 Å/second in a 2.38 wt % TMAH aqueous solutionprovided that the film has a thickness of 0.1 to 10 μm (1000 to 100000Å).

(d) Alkali Dissolution Rate in TMAH Aqueous Solution

In the present invention, the polysiloxanes (Ia) and (Ib) individuallyhave specific dissolution rates in TMAH aqueous solutions. Thedissolution rate of polysiloxane in a TMAH aqueous solution is measuredin the following manner. First, the polysiloxane is diluted withpropyleneglycol monomethyletheracetate (hereinafter, referred to as“PGMEA”) to be 35 wt %, and stirred and dissolved with a stirrer for 1hour at room temperature. In a clean-room under an atmosphere oftemperature: 23.0±0.5° C. and humidity: 50±5.0%, the preparedpolysiloxane solution is then dropped with a pipet in an amount of 1 cconto a 4-inch silicon wafer of 525 μm thickness at the center area, andspin-coated to form a coating of 2±0.1 μm thickness. Thereafter, thecoating is pre-baked for 90 seconds on a hot-plate at 100° C. to removethe solvent. The thickness of the coating is then measured with aspectro-ellipsometer (manufactured by J. A. Woollam).

Subsequently, the silicon wafer covered with the coating is placed in a6 cm-diameter glass petri dish filled with 100 ml of a TMAH aqueoussolution of predetermined concentration at 23.0±0.1° C., and left to beimmersed. The time it takes for the coating to disappear is measured,and the dissolution rate is obtained by dividing the thickness by thetime it takes for the solution to dissolve and remove the coating in thearea from the wafer edge to 10-nm inside. Otherwise, in the case wherethe dissolution rate is extremely slow, the wafer is immersed in theTMAH aqueous solution for a predetermined time and then heated for 5minutes on a hot-plate at 200° C. to remove water soaking in the coatingduring the measurement of dissolution rate, and thereafter the thicknessof the coating is measured. The thickness change between before andafter the immersion is divided by the immersing time to obtain thedissolution rate. The above measurement is repeated five times and theobtained values are averaged to determine the dissolution rate of thepolysiloxane.

As described above, either a single polysiloxane or a polysiloxanemixture can be used in the present invention. In either case, the weightaverage molecular weight (Mw) of the polysiloxane or polysiloxanemixture is preferably 5000 or less, more preferably 1000 to 4000. If theweight average molecular weight is less than 1000, it is difficult toavoid heat collapsing of the pattern. On the other hand, if it is morethan 5000, the coating is so insufficiently dissolved away in thedevelopment step that satisfying resolution cannot be obtained and alsothat the sensitivity may be lowered. Here, the “weight average molecularweight” means a polystyrene-reduced weight average molecular weightdetermined by gel permission chromatography (GPC).

(II) Silicon-Containing Compound

The composition of the present invention contains a silicon-containingcompound. The silicon-containing compound used in the present inventionhas an ureido bond, and is preferably represented by the followingformula (ii):

In the formula, each R is selected from the group consisting of hydrogenand hydrocarbon groups which may be substituted, and plural Rs may bethe same or different from each other provided that at least one Rcontains a silicon-containing group.

It is not clear what function the silicon compound having an ureido bondhas in the present invention, but the structure of N—C(═O)—N is thoughtto provide the effect of the invention and hence Rs in the other partare not particularly restricted. However, each R is preferably selectedfrom hydrogen and hydrocarbon groups, which may be saturated orunsaturated and which may have straight-chain, branched-chain or cyclicstructures. Further, plural Rs may be connected to form a cyclicstructure. Furthermore, hydrogen atoms in the hydrocarbon groups may besubstituted with hydroxyl groups, carbonyl groups, carboxyl groups,alkoxy groups, or silicon-containing groups such as silanol andalkylsilyl groups. It is necessary for at least one R to be asilicon-containing group. That is because this compound serves as asilicon-containing compound in the present invention.

The reason why the silicon-containing compound is used in the presentinvention is that it has high compatibility with the polysiloxane in thecomposition. Actually, even if a compound having an ureido bond but notcontaining silicon is adopted, the effect of the present inventioncannot be obtained. This is thought to be because the expected reactiondoes not proceed sufficiently if the compound has poor compatibilitywith the polysiloxane in the composition. The silicon-containingcompound contains silicon preferably in the form of a silyl group, asiloxane bond or a silazane bond.

The silicon-containing compound is preferably represented by thefollowing formula (iia) or (iib):

In the formulas, R is a silicon-containing hydrocarbon group, such as,an alkylsilyl group or a silicone group. The compound represented by theformula (iib), which is a silicon-containing isocyanurate compound, isparticularly preferred because the effect of the present invention canbe obtained remarkably.

Preferred examples of the silicon-containing compound used in thepresent invention include compounds represented by the following formula(iia-1) (X-12-9659 or KBM-9659 [trademark], manufactured by Shin-EtsuChemical Co., Ltd.) and compounds represented by the following formula(iib-1) (X-12-9659 or KBM-585 [trademark], manufactured by Shin-EtsuChemical Co., Ltd.). Further, also preferred are polymers containingthose structures or containing those structures partly substituted withsilicone groups.

Among the above, particularly preferred is an isocyanategroup-containing silane compound represented by the formula (iia-1).

If the silicon-containing compound contains a silicone structure and hastoo large a molecular weight, it has poor compatibility with thepolysiloxane in the composition. Consequently, the coating is dissolvedin a developer so insufficiently that reactive groups remains in thecoating. This may cause problems in that, for example, the coatingcannot have enough chemical resistance against post-processes. In viewof that, the silicon-containing compound has a weight average molecularweight of preferably 5000 or less, more preferably 1000 to 4000.

If the silicon-containing compound is used in an increased amount in thepresent invention, the polymerization reaction by exposure is sopromoted that post-exposure baking can be omitted. Accordingly, theamount of the silicon-containing compound is preferably 3.0 weight partsor more, further preferably 5.0 weight parts or more based on 100 weightparts of the polysiloxane. On the other hand, however, if thesilicon-containing compound is added too much, the coating even in anunexposed area may be cured to lower resolution and contrast of thepattern. In view of that, the amount of the silicon-containing compoundis preferably 15.0 weight parts or less, further preferably 12.0 weightparts or less based on 100 weight parts of the polysiloxane.

(iii) Polymerization Initiator

The negative-working photosensitive siloxane composition of the presentinvention contains a polymerization initiator. There are two kinds ofpolymerization initiators: one is a polymerization initiator generatingan acid or based when exposed to radiation, and the other is apolymerization initiator generating an acid or based when exposed toheat.

The polymerization initiator can reinforce the pattern shape or canincrease contrast in development to improve the resolution. Thepolymerization initiator adoptable in the present is, for example, aphoto acid-generator, which decomposes when exposed to radiation andreleases an acid serving as an active substance for photo-curing thecomposition; a photo base-generator, which releases a base; a heatacid-generator, which decomposes when exposed to heat and releases anacid serving as an active substance for heat-curing the composition; anda heat base-generator, which releases a base. Examples of the radiationinclude visible light, UV rays, IR rays, X-rays, electron beams, α-raysand γ-rays.

The optimal amount of the polymerization initiator depends on the kindof the active substance released from the decomposed initiator, on theamount of the released substance, on the required sensitivity and on thedissolution contrast between the exposed and unexposed areas. However,it is preferably 0.001 to 10 weight parts, more preferably 0.01 to 5weight parts, based on 100 weight parts of the polysiloxane. If theamount is less than 0.001 weight part, the dissolution contrast betweenthe exposed and unexposed areas may be too low to obtain the effect ofthe initiator. On the other hand, if it is more than 10 weight parts,the formed film may suffer from cracks or may be colored bydecomposition of the initiator so seriously that the colorlesstransparency of the coating may be impaired. Further, if thepolymerization initiator is contained too much, the decomposed initiatormay lower the electric insulation of the cured film or may release gasesto cause troubles in the post-processes. Furthermore, it oftendeteriorates resistance of the coating against a photoresist removercontaining monoethanolamine or the like as a main component.

Examples of the above photo acid-generator include diazomethanecompounds, diphenyliodonium salts, triphenylsulfonium salts, sulfoniumsalts, ammonium salts, phosphonium salts and sulfonamide compounds. Thestructures of those photo acid-generators can be represented by theformula (A):

R⁺X⁻  (A).

In the above formula, R⁺ is hydrogen or an organic ion modified bycarbon atoms or other hetero atoms provided that the organic ion isselected from the group consisting of alkyl groups, aryl groups, alkenylgroups, acyl groups and alkoxy groups. For example, R⁺ isdiphenyliodonium ion or triphenylsulfonium ion.

Further, X⁻ is preferably a counter ion represented by any of thefollowing formulas:

SbY₆ ⁻,

AsY₆ ⁻,

R^(a) _(p)PY_(6-p) ⁻,

R^(a) _(q)BY_(4-q) ⁻,

R^(a) _(q)GaY_(4-q) ⁻,

R^(a)SO₃ ⁻,

(R^(a)SO₂)₃C⁻,

(R^(a)SO₂)₂N⁻,

R^(a)COO⁻, and

SCN⁻

in whichY is a halogen atom,R^(a) is an alkyl group of 1 to 20 carbon atoms or an aryl group of 6 to20 carbon atoms provided that each group is substituted with asubstituent group selected from the group consisting of fluorine, nitrogroup and cyano group,R^(b) is hydrogen or an alkyl group of 1 to 8 carbon atoms,P is a number of 0 to 6, andq is a number of 0 to 4.

Concrete examples of the counter ion include: BF₄ ⁻, (C₆F₅)₄B⁻,((CF₃)₂C₆H₃)₄B⁻, PF₆ ⁻, (CF₃CF₂)₃PF₃ ⁻, SbF₆ ⁻, (C₆F₅)₄Ga⁻,((CF₃)₂C₆H₃)₄Ga⁻, SCN⁻, (CF₃SO₂)₃C⁻, (CF₃SO₂)₂N⁻, formate ion, acetateion, trifluoromethanesulfonate ion, nonafluorobutanesulfonate ion,methanesulfonate ion, butanesulfonate ion, benzenesulfonate ion,p-toluenesulfonate ion, and sulfonate ion.

Among the photo acid-generators usable in the present invention, thosegenerating sulfonic acids or boric acids are particularly preferred.Examples thereof include tricumyliodoniumteterakis(pentafluorophenyl)borate (PHOTOINITIATOR2074 [trademark],manufactured by Rhodorsil), diphenyliodoniumtetra(perfluorophenyl)borate, and a compound having sulfonium ion andpentafluoroborate ion as the cation and anion moieties, respectively.Further, examples of the photo acid-generators also includetriphenylsulfonium trifluoromethanesulfonate, triphenylsulfoniumcamphorsulfonate, triphenylsulfonium tetra(perfluorophenyl)borate,4-acetoxyphenyldimethylsulfonium hexafluoroarsenate,1-(4-n-butoxynaphthalene-1-yl)tetrahydrothiopheniumtrifluoromethanesulfonate,1-(4,7-dibutoxy-1-naphthalenyl)tetrahydrothiopheniumtrifluoromethanesulfonate, diphenyliodonium trifluoromethanesulfonate,and diphenyliodonium hexafluoroarsenate. Furthermore, it is still alsopossible to adopt photo add-generators represented by the followingformulas:

in whicheach A is independently a substituent group selected from the groupconsisting of an alkyl group of 1 to 20 carbon atoms, an alkoxy group of1 to 20 carbon atoms, an aryl group of 6 to 20 carbon atoms, analkylcarbonyl group of 1 to 20 carbon atoms, an arylcarbonyl group of 6to 20 carbon atoms, hydroxyl group, and amino group;each p is independently an integer of 0 to 5; andB⁻ is a fluorinated alkylsulfonate group, a fluorinated arylsulfonategroup, a fluorinated alkylborate group, an alkylsulfonate group or anarylsulfonate group.It is also possible to use photo acid-generators in which the cationsand anions in the above formulas are exchanged each other or combinedwith various other cations and anions described above. For example, anyone of the sulfonium ions represented by the above formulas can becombined with tetra(perfluorophenyl)borate ion, and also any one of theiodonium ions represented by the above formulas can be combined withtetra(perfluorophenyl)borate ion. Those can be still also employed asthe photo acid-generators.

The above heat acid-generator is, for example, a salt or ester capableof generating an organic acid. Examples thereof include: variousaliphatic sulfonic acids and salts thereof; various aliphatic carboxylicacids, such as, citric acid, acetic acid and maleic acid, and saltsthereof; various aromatic carboxylic acids, such as, benzoic acid andphthalic acid, and salts thereof; aromatic sulfonic acids and ammoniumsalts thereof; various amine salts; aromatic diazonium salts; andphosphonic acid and salts thereof. Among the heat acid-generators usablein the present invention, salts of organic acids and organic bases arepreferred, and further preferred are salts of sulfonic acids and organicbases.

Examples of the preferred heat acid-generators containing sulfonate ionsinclude p-toluenesulfonates, benzenesulfonates,p-dodecylbenzenesulfonates, 1,4-naphthalenedisulfonates, andmethanesulfonates. Those heat acid-generators can be used singly or inmixture.

Examples of the above photo base-generator include multi-substitutedamide compounds having amide groups, lactams, imide compounds, andcompounds having those structures.

Examples of the above heat base-generator include: imidazolederivatives, such as, N-(2-nitrobenzyloxycarbonyl)imidazole,N-(3-nitrobenzyloxycarbonyl)imidazole,N-(4-nitrobenzyloxycarbonyl)imidazole,N-(5-methyl-2-nitrobenzyloxycarbonyl)imidazole, andN-(4-chloro-2-nitrobenzyloxycarbonyl)imidazole;1,8-diazabicyclo(5,4,0)undecene-7, tertiary amines, quaternary ammoniumsalts, and mixture thereof. Those base-generators as well as theacid-generators can be used singly or in mixture.

(IV) Solvents

The negative-working photosensitive siloxane composition of the presentinvention contains a solvent. There are no particular restrictions onthe solvent as long as it can homogeneously dissolve or disperse theabove polysiloxane, the polymerization initiator, and additivesincorporated optionally. Examples of the solvent usable in the presentinvention include: ethylene glycol monoalkyl ethers, such as, ethyleneglycol monomethyl ether, ethylene glycol monoethyl ether, ethyleneglycol monopropyl ether, and ethylene glycol monobutyl ether; diethyleneglycol dialkyl ethers, such as, diethylene glycol dimethyl ether,diethylene glycol diethyl ether, diethylene glycol dipropyl ether, anddiethylene glycol dibutyl ether; ethylene glycol alkyl ether acetates,such as, methyl cellosolve acetate and ethyl cellosolve acetate;propylene glycol alkyl ether acetates, such as, propylene glycolmonomethyl ether acetate (PGMEA), propylene glycol monoethyl etheracetate, and propylene glycol monopropyl ether acetate; aromatichydrocarbons, such as, benzene, toluene and xylene; ketones, such as,methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutylketone, and cyclohexanone; alcohols, such as, ethanol, propanol,butanol, hexanol, cyclohexanol, ethylene glycol, and glycerin; esters,such as, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate and ethyllactate; and cyclic asters, such as, γ-butyrolactone. Those solvents areused singly or in combination of two or more, and the amount thereofdepends on the coating method and the thickness of the coating.

The amount of the solvent in the negative-working photosensitivesiloxane composition can be freely controlled according to the method ofcoating the composition. For example, if the composition is to bespray-coated, it can contain the solvent in an amount of 90 wt % ormore. Further, if a slit-coating method, which is often adopted incoating a large substrate, is to be carried out, the content of thesolvent is normally 60 wt % or more, preferably 70 wt % or more.However, the amount of the solvent gives little effect to thecharacteristics of the negative-working photosensitive siloxanecomposition according to the present invention.

(V) Additives

The negative-working photosensitive siloxane composition of the presentinvention may contain other additives, if necessary. Examples of theadditives include developer-dissolution promoter, scum remover, adhesionenhancer, polymerization inhibitor, defoaming agent, surfactant andsensitizer.

The developer-dissolution promoter or the scum remover has a function ofcontrolling solubility of the formed coating in a developer and therebyof preventing scum from remaining on the substrate after development. Asthis additive, crown ethers can be adopted. Crown ethers having thesimplest structures are represented by the general formula:(—CH₂—CH₂—O—)_(n). Among them, crown ethers of the formula in which n is4 to 7 are preferably used in the present invention. Meanwhile, crownethers are often individually referred to as “x-crown-y-ether” in whichx and y represent the total number of atoms forming the ring and thenumber of oxygen atoms included therein, respectively. In the presentinvention, the additive is preferably selected from the group consistingof crown ethers of X=12, 15, 18 and 21 and y=x/3, benzo-condensedproducts thereof, and cyclohexyl-condensed products thereof. Preferredexamples of the crown ethers include 21-crown-7-ether, 18-crown-6-ether,15-crown-5-ether, 12-crown-4-ether, dibenzo-21-crown-7-ether,dibenzo-18-crown-6-ether, dibenzo-15-crown-5-ether,dibenzo-12-crown-4-ether, dicyclohexyl-21-crown-7-ether,dicyclohexyl-18-crown-6-ether, dicyclohexyl-15-crown-5-ether, anddicyclohexyl-12-crown-4-ether. Among them, it is particularly preferredto select the additive from the group consisting of 18-crown-6-ether and15-crown-5-ether. The amount thereof is preferably 0.05 to 15 weightparts, more preferably 0.1 to 10 weight parts, based on 100 weight partsof the polysiloxane.

The adhesion enhancer has a function of preventing the pattern frombeing peeled off by stress applied after curing when a cured film isformed from the negative-working photosensitive siloxane composition ofthe present invention. As the adhesion enhancer, imidazoles and silanecoupling agents are preferably adopted. Examples of the imidazolesinclude 2-hydroxybenzimidazole, 2-hydroxyethylbenzimidazole,benzimidazole, 2-hydroxyimidazole, imidazole, 2-mercaptoimidazole, and2-aminoimidazole. Among them, particularly preferred are2-hydroxybenzimidazole, benzimidazole, 2-hydroxyimidazole and imidazole.

As the silane coupling agents, known compounds, such as, epoxy-silanecoupling agents, amino-silane coupling agents and mercapto-silanecoupling agents, can be preferably adopted. Examples thereof include3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane,N-2-(aminoethyl)-3-aminopropyltrimethoxysilane,N-2-(aminoethyl)-3-aminopropyltriethoxysilane,3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane,3-ureidopropyltrimethoxysilane, 3-chloropropyltrimethoxysilane,3-mercaptopropyitrimethoxysilane, and3-isocyanatepropyltrimethoxysilane. Those can be used singly or incombination of two or more. The amount thereof is preferably 0.05 to 15weight parts based on 100 weight parts of the polysiloxane.

It is also possible to employ a silane or siloxane compound having anacidic group as the silane coupling agent. Examples of the acidic groupinclude carboxyl group, an acid anhydride group, and phenolic hydroxylgroup. If having a monobasic acid group such as carboxyl or phenolichydroxyl group, the compound is preferably a single silicon-containingcompound having two or more acidic groups.

Examples of the above silane coupling agent include compoundsrepresented by the following formula (B):

X_(n)Si(OR³)_(4-n)  (B)

and polymers having polymerization units derived from them. Thosepolymers may comprise plural kinds of units different in X or R³ incombination.

In the above formula, R³ is a hydrocarbon group, such as, an alkylgroup. Examples thereof include methyl, ethyl, n-propyl, iso-propyl andn-butyl groups. The formula (A) contains plural R^(a)s, which may be thesame or different from each other.

In the above formula, X includes an acidic group, such as, thiol,phosphonium, borate, carboxyl, phenol, peroxide, nitro, cyano, sulfa oralcohol group. The acidic group may be protected with a protectivegroup, such as, acetyl, aryl, amyl, benzyl, methoxymethyl, mesyl,tollyl, trimethoxysilyl, triethoxysilyl, triisopropylsilyl or tritylgroup. Further, X may be an acid anhydride group.

Among the above, R³ and X are preferably methyl group and a carboxylicacid anhydride group, respectively. For example, an acid anhydridegroup-containing silicone is preferred. Concrete examples thereof are acompound represented by the following formula (B-1) (X-12-967C[trademark], manufactured by Shin-Etsu Chemical Co., Ltd.) and asilicon-containing polymer, such as silicone, having a structurecorresponding the formula at the terminal or in the side chain andhaving a weight average molecular weight of 1000 or less. Also preferredis a dimethyl silicone having a weight average molecular weight of 4000or less and having a terminal modified with an acidic group, such as,thiol, phosphonium, borate, carboxyl, phenol, peroxide, nitro, cyano orsulfo group. Examples thereof include compounds represented by thefollowing formulas (B-2) and (B-3) (X-22-2290AS and X-22-1821[trademark], manufactured by Shin-Etsu Chemical Co., Ltd.).

If the silane coupling agent contains a silicone structure and has toolarge a molecular weight, it has poor compatibility with thepolysiloxane in the composition. Consequently, the coating is dissolvedin a developer so insufficiently that reactive groups may remain in thecoating. This may cause problems in that, for example, the coatingcannot have enough chemical resistance against post-processes. In viewof that, the silicon-containing compound has a weight average molecularweight of preferably 5000 or less, more preferably 1000 to 4000.Further, if the acidic group-containing silane or siloxane compound isemployed as the silane coupling agent, the amount thereof is preferably0.01 to 15 weight parts based on 100 weight parts of the polysiloxanemixture (I).

As the polymerization inhibitor, nitrone derivatives, nitroxide radicalderivatives and hydroquinone derivatives, such as, hydroquinone,methylhydroquinone and butyllhydroquinine, can be incorporated. Thosecan be used singly or in combination of two or more. The amount thereofis preferably 0.1 to 10 weight parts based on 100 weight parts of thepolysiloxane.

Examples of the defoaming agent include: alcohols (C₁ to C₁₈); higherfatty acids, such as, oleic acid and stearic acid; higher fatty acidesters, such as, glycerin monolaurate; polyethers, such as,polyethylenglycol (PEG) (Mn: 200 to 10000) and polypropyleneglycol (Mn:200 to 10000); silicone compounds, such as, dimethyl silicone oil,alkyl-modified silicone oil and fluoro-silicone oil; and organicsiloxane surfactants described below in detail. Those can be used singlyor in combination of two or more. The amount thereof is preferably 0.1to 3 weight parts based on 100 weight parts of the polysiloxane.

If necessary, the negative-working photosensitive siloxane compositionof the present invention can further contain a surfactant, which isincorporated with the aim of improving coatability, developability andthe like. The surfactants usable in the present invention are, forexample, nonionic, anionic and amphoteric surfactants.

Examples of the nonionic surfactants include: polyoxyethylene alkylethers, such as, polyoxyethylene lauryl ether, polyoxyethylene oleylether and polyoxyethylene cetyl ether; polyoxyethylene fatty aciddiethers; polyoxyethylene fatty acid monoethers;polyoxyethylene-polyoxypropylene block polymer; acetylene alcohol;acetylene glycol derivatives, such as, acetylene glycol, polyethoxyateof acetylene alcohol, and polyethoxyate of acetylene glycol;silicon-containing surfactants, such as, Fluorad ([trademark],manufactured by Sumitomo 3M Limited), MEGAFAC ([trademark], manufacturedby DIC Corporation), and Surufuron ([trademark], manufactured by AsahiGlass Co., Ltd.); and organic siloxane surfactants, such as, KP341([trademark], manufactured by Shin-Etsu Chemical Co., Ltd.). Examples ofthe above acetylene glycols include: 3-methyl-1-butyne-3-ol,3-methyl-1-pentyne-3-ol, 3,6-dimethyl-4-octyne-3,6-diol,2,4,7,9-tetramethyl-5-decyne-4,7-diol, 3,5-dimethyl-1-hexyne-3-ol,2,5-dimethyl-3-hexyne-2,5-diol, and 2,5-dimethyl-2,5-hexanediol.

Examples of the anionic surfactants include: ammonium salts and organicamine salts of alkyldiphenylether disulfonic acids, ammonium salts andorganic amine salts of alkyldiphenylether sulfonic acids, ammonium saltsand organic amine salts of alkylbenzenesulfonic acids, ammonium saltsand organic amine salts of polyoxyethylenealkylether sulfuric acids, andammonium salts and organic amine salts of alkylsulfuric acids.

Further, examples of the amphoteric surfactants include2-alkyl-N-carboxymethyl-N-hydroxyethyl imidazolium betaine, and laurylicacid amidopropyl hydroxy sulfone betaine.

Those surfactants can be used singly or in combination of two or more.The amount thereof is normally 50 to 2000 ppm, preferably 100 to 1000ppm based on the negative-working photosensitive siloxane composition ofthe present invention.

According to necessity, a sensitizer can be incorporated into thenegative-working photosensitive siloxane composition of the presentinvention. Examples of the sensitizer preferably used in the compositionof the present invention include coumarin, ketocoumarin, derivativesthereof, thiopyrylium salts, and acetophenone. Specifically, concreteexamples thereof include: sensitizing dyes, such as,p-bis(o-methylstryl)benzene,7-dimethylamino-4-methylquinolone-2,7-amino-4-methylcoumarin,4,6-dimethyl-7-ethylaminocoumarin, 2-(p-dimethylaminostryl)pyridylmethyliodide, 7-diethylaminocoumarin, 7-diethylamino-4-methylcoumarin,2,3,5,6-1H,4H-tetrahydro-8-methylquinolidino-<9,9a,1-gh>coumarin,7-diethylamino-4-trifluoromethylcoumarin,7-dimethylamino-4-trifluoromethylcoumarin,7-amino-4-trifluoromethylcoumarin,2,3,5,6-1H,4H-tetrahydroquinolidino-<9,9a,1-gh>coumarin,7-ethylamino-6-methyl-4-trifluoromethylcoumarin,7-ethylamino-4-trifluoromethylcoumarin,2,3,5,6-1H,4H-tetrahydro-9-carboethoxyquinolidino-<9,9a,1-gh>coumarin,3-(2′-N-methylbenzimidazolyl)-7-N,N-diethylaminocoumarin,N-methyl-4-trifluoromethylpiperidino-<3,2-g>coumarin,2-(p-dimethylaminostryl)benzothiazolylethyl iodide,3-(2′-benzimidazolyl)-7-N,N-diethylaminocoumarin,3-(2′-benzothiazolyl)-7-N,N-diethylaminocoumarin, and pyrylium orthiopyrylium salts represented by the following formula. The sensitizingdye makes it possible to carry out patterning by use of inexpensivelight sources, such as, a high-pressure mercury lamp (360 to 430 nm).The amount thereof is preferably 0.05 to 15 weight parts, morepreferably 0.1 to 10 weight parts based on 100 weight parts of thepolysiloxane.

X R₁ R₂ R₃ Y S OC₄H₉ H H BF₄ S OC₄H₉ OCH₃ OCH₃ BF₄ S H OCH₃ OCH₃ BF₄ SN(CH₃)₂ H H ClO₂ O OC₄H₉ H H SbF₆

As the sensitizer, it is also possible to adopt a compound having ananthracene skeleton. Concrete examples thereof include compoundsrepresented by the following formula (C):

in whicheach R³¹ is independently a substituent group selected from the groupconsisting of alkyl groups, aralkyl groups, aryl groups, hydroxyalkylgroups, alkoxyalkyl groups, glycidyl groups and halogenated alkylgroups;each R³² is independently a substituent group selected from the groupconsisting of hydrogen, alkyl groups, alkoxy groups, halogen atoms,nitro groups, sulfonic acid groups, hydroxyl group, amino groups, andcarboalkoxy groups; andeach k is independently an integer of 0 and 1 to 4.

The sensitizers having anthracene skeletons are disclosed in, forexample, Patent documents 3 and 4. When the sensitizer having ananthracene skeleton is added, the amount thereof is preferably 0.01 to 5weight parts based on 100 weight parts of the polysiloxane mixture (1).

Further, if necessary, a stabilizer can be also added into thenegative-working photosensitive siloxane composition of the presentinvention. The stabilizer can be freely selected from those generallyknown. However, in the present invention, aromatic amines are preferredbecause they have high effect on stabilization. Among those aromaticamines, preferred are pyridine derivatives and particularly preferredare pyridine derivatives having bulky substituent groups at 2- and6-positions. Concrete examples thereof are as follows:

Method for Forming a Cured Film

The cured film-formation method according to the present inventioncomprises: coating the above negative-working photosensitive siloxanecomposition on a substrate surface, to form a coating; and heating tocure the coating. The cured film-formation method will be explainedbelow in the order of the steps.

(1) Coating Step

First, the above negative-working photosensitive siloxane composition iscoat on a substrate to form a coating. In the present invention, thecoating can be formed from the photosensitive siloxane composition inany known manner. Specifically, the coating method can be freelyselected from, for example, immersion coating, roll coating, barcoating, brush coating, spray coating, doctor coating, flow coating,spin coating, and slit coating. The substrate to be coated with thecomposition can be also properly selected from, for example, a siliconsubstrate, a glass substrate and a resin film. According to necessity,those substrates may be equipped with various semiconductor elements andthe like formed thereon. If the substrate is in the form of a film, thecoating can be formed by gravure coating. If desired, a drying step canbe independently carried out after coating. Further, according tonecessity, the coating step may be carried out once or twice or more soas to form a coating of desired thickness.

(2) Prebaking Step

After the negative-working photosensitive siloxane composition is coatto form a coating, the coating is preferably subjected to prebaking(preheating treatment) for the purposes of drying the coating and ofreducing the solvent remaining therein. The prebaking step is carriedout at a temperature of generally 50 to 150° C., preferably 90 to 120°C. for 10 to 300 seconds, preferably 30 to 120 seconds on a hot-plate orfor 1 to 30 minutes in a clean oven.

(3) Exposing Step

After the coating is formed, the surface thereof is exposed to light. Asa light source for the exposure, it is possible to adopt any lightsource used in conventional pattern-formation processes. Examples of thelight source include high-pressure mercury lamp, low-pressure mercurylamp, metal halide lamp, xenon lamp, laser diode and LED. Light for theexposure is normally UV rays of g-line, h-line, i-line or the like.Except for in the case of ultrafine fabrication of semiconductors andthe like, it is general to use light of 360 to 430 nm (high-pressuremercury lamp) for patterning in several micrometers to several tens ofmicrometers. Particularly in producing a liquid crystal display, lightof 430 nm is often used. As described above, in that case, it isadvantageous to combine a sensitizing dye with the negative-workingphotosensitive siloxane composition of the present invention. Energy ofthe exposure light depends on the light source and the thickness of thecoating, but is generally 10 to 2000 mJ/cm², preferably 20 to 1000mJ/cm². If the exposure energy is lower than 10 mJ/cm², it is oftendifficult to obtain satisfying resolution. On the other hand, however,if it is more than 2000 mJ/cm², the coating is exposed so excessivelythat the exposure may cause halation.

In order that the coating can be imagewise exposed to light, commonphotomasks are employable. Any photomask can be selected from knownones. There are no particular restrictions on the environmentalconditions in the exposure, and the exposure can be carried out under anambient atmosphere (the normal atmosphere) or under a nitrogenatmosphere. If a film is to be formed on the whole surface of thesubstrate, the whole substrate surface is exposed to light. In thepresent invention, the term “pattern film” includes a film thus formedon the whole surface of the substrate.

(4) Post-Exposure Baking Step

After the exposing step, post-exposure baking is generally carried outaccording to necessity with the aim of promoting interpolymer reactionscaused by the reaction initiator in the exposed area of the coating.This heating treatment is not for the purpose of curing the coatingcompletely but for the purpose of making it possible to leave a desiredpattern on the substrate after development and to remove the part otherthan the pattern by development. Nevertheless, if the negative-workingphotosensitive siloxane composition of the present invention is used,the reactions proceed sufficiently without the post-exposure bakingstep. Accordingly, in the present invention, the post-exposure bakingstep is dispensable and can be omitted to improve the productionefficiency and to achieve cost-down. Even so, it is sometimesadvantageous to promote the reaction by the post-exposure baking step.The post-exposure baking step does not impair the characteristics of thecured film, and hence may be carried out as an auxiliary step.

When the post-exposure baking step is carried out, it is possible to usea hot-plate, an oven, a furnace or the like. The heating temperatureshould not be too high because it is unfavorable for acid generated byexposure in the exposed area to diffuse into the unexposed area. In viewof that, the temperature of post-exposure baking is preferably 40 to150° C., more preferably 60 to 120° C. If necessary, the temperature maybe step-by-step increased so as to control the curing speed of thecomposition. There are no particular restrictions on the atmosphere ofbaking. In order to control the curing speed of the composition, theatmosphere can be selected from, for example, an atmosphere of inert gassuch as nitrogen gas, a vacuum atmosphere, a reduced-pressureatmosphere, an oxygen gas atmosphere and the like. The baking time ispreferably longer than a certain period so as to keep higher homogeneityof temperature history in the wafer surface, but also preferably notexcessively long so as to prevent the diffusion of acid. Inconsideration of those, the baking time is preferably 20 to 500 seconds,more preferably 40 to 300 seconds.

(5) Development Step

After the exposing step, the coating is optionally subjected to thepost-exposure baking step and thereafter subjected to developingtreatment. As a developer used in the development step, it is possibleto adopt any developer employed in developing conventionalphotosensitive siloxane compositions. In the present invention, TMAHaqueous solutions are used to determine the dissolution rate ofpolysiloxane but they by no means restrict the developer for forming acured film. Preferred examples of the developer include alkalidevelopers which are aqueous solutions of alkaline compounds, such as,tetraalkylammonium hydroxide, choline, alkali metal hydroxides, alkalimetal (meta)silicates (hydrate), alkali metal (meta)phosphates(hydrate), ammonia, alkylamines, alkanolamines, and heterocyclic amines.Particularly preferred is an aqueous solution of tetraalkylammoniumhydroxide. Those alkali developers may contain water-soluble organicsolvents, such as, methanol and ethanol, or surfactants, if necessary.The developing method can be freely selected from known methods, suchas, dip, paddle, shower, slit, cap coat and spray development processes.As a result of the development, a pattern can be obtained. Afterdeveloped with a developer, the pattern is preferably washed with water.

(6) Heating Step

After the development step, the obtained pattern film is heated andthereby cured. The heating apparatus used in the heating step can be thesame as those used in the post-exposure baking step. The heatingtemperature in this heating step is not particularly restricted as longas the coating can be cured, but is normally 150 to 400° C., preferably200 to 350° C. If it is lower than 150° C., unreacted silanol groups mayremain. The remaining silanol groups may prevent the cured film fromhaving sufficient chemical resistance and also may increase thepermittivity of the cured film. In view of that, the heating temperatureis preferably 150° C. or more. The heating time is also not particularlyrestricted, but is generally 10 minutes to 24 hours, preferably 30minutes to 3 hours. Here, the “heating time” means a period of time fromwhen the temperature of the pattern film is elevated to reach the aimedheating temperature. It normally takes several minutes to several hoursto heat the pattern film from the initial temperature up to the aimedheating temperature.

The cured film thus obtained can achieve excellent heat-resistance,transparency and relative permittivity. Specifically, it can achieveheat-resistance of 400° C. or more, optical transmittance of 95% ormore, and relative permittivity of 4 or less, preferably 3.3 or less.Those characteristics of light transparency and relative permittivityare not realized by conventional acrylic materials, and hence the curedfilm of the present invention can be advantageously used in variousapplications. For example, as described above, it can be adopted as aplanarization film of various devices such as flat panel display (FPD),as an interlayer insulating film for low temperature polysilicon, as abuffer coat film for IC chips, and as a transparent protective film.

The present invention will be further explained concretely by use of thefollowing examples and comparative examples. However, those examples andcomparative examples by no means restrict the present invention.

Example 1

A polysiloxane mixture soluble after prebaked in a 2.38% TMAH aqueoussolution was prepared to be a 35% PGMEA solution. To the polysiloxanemixture, a photo acid-generator having sulfonium and borate ions as thecation and anion moieties, respectively, and a silicon-containingcompound (KBM9659 [trademark], manufactured by Shin-Etsu Chemical Co.,Ltd.) were added in amounts of 4.0 wt % and 10 wt %, respectively, basedon the weight of the polysiloxane. Further, a surfactant (KF-53[trademark], manufactured by Shin-Etsu Chemical Co., Ltd.) was alsoadded in an amount of 0.3 wt % based on the weight of the polysiloxane,to obtain a negative-working photosensitive siloxane composition.

That photosensitive siloxane composition was spin-coated on a siliconwafer, and then prebaked on a hot-plate at 100° C. for 90 seconds toform a coating of 2 μm thickness. The prebaked coating was subjected toexposure at 600 mJ/cm² with g-, h-, i-line exposure apparatus,subsequently immersed in a 2.38% TMAH aqueous solution for 60 seconds,and thereafter rinsed with pure water for 30 seconds. As a result, itwas confirmed that a line and space (L/S) pattern and a contact hole(C/H) pattern were clearly formed in 3 μm size without residue left eventhough the post-exposure baking step was not necessarily carried out.

Example 2

The procedure of Example 1 was repeated except that thesilicon-containing compound was changed to KBE-585 in an amount of 10weight parts based on 100 weight parts of the polysiloxane and thesolvent of the composition was also changed to PGMEA:ethanol=90:10. Thatis because KBE-585 was slightly soluble in PGMEA.

As a result, it was confirmed that a line and space (L/S) pattern and acontact hole (C/H) pattern were formed in 3 μm size even though thepost-exposure baking step was not necessarily carried out

Example 3

The procedure of Example 1 was repeated except that thesilicon-containing compound was changed to a silane coupling agentX-12-967C ([trademark], manufactured by Shin-Etsu Chemical Co., Ltd.) inan amount of 1.0 wt %.

As a result, it was confirmed that a line and space (L/S) pattern and acontact hole (C/H) pattern were formed in 3 μm size without residue lefteven though the post-exposure baking step was not necessarily carriedout.

Example 4

The procedure of Example 1 was repeated except that2,6-di-tert-butyl-4-methylpyridine (manufactured by Tokyo ChemicalIndustry Co., Ltd.) as an amine additive was added in an amount of 0.1wt % based on the weight of the polysiloxane.

As a result, it was confirmed that a line and space (L/S) pattern and acontact hole (C/H) pattern were formed in 3 μm size even though thepost-exposure baking step was not necessarily carried out. In addition,the storage stability at room temperature was found to be improvedalthough it was slight in degree.

Example 5

The procedure of Example 1 was repeated except that the polymerizationinitiator was changed to a photo acid-generator having iodonium salt andborate as the cation and anion moieties, respectively, in an amount of4.0 wt % based on the weight of the polysiloxane and also that asensitizer (ANTHRACURE UVS-1331 [trademark], manufactured by KAWASAKIKASEI CHEMICALS LTD.) was added in an amount of 0.2 wt % based on theweight of the polysiloxane.

As a result, similarly to the examples employing the sulfonium salt, itwas confirmed that a line and space (L/S) pattern and a contact hole(C/H) pattern were formed in 3 μm size without residue left.

Comparative Example 1

The procedure of Example 1 was repeated except that the amount of thesilicon-containing compound was changed to 20 weight parts based on 100weight parts of the polysiloxane. As a result, there was an insolublelayer of about 1000 Å thickness left in the unexposed area and hence itwas impossible to obtain a satisfying image.

Comparative Example 2

The procedure of Example 1 was repeated except for not adding thesilicon-containing compound. As a result, the formed coating of thecomposition was completely dissolved away in the developer and hence itwas impossible to develop the pattern.

Comparative Example 3

The procedure of Example 1 was repeated except that thesilicon-containing compound was replaced with diallyl isocyanurate,which is a compound not containing silicon, in an amount of 10 weightparts based on 100 weight parts of the polysiloxane. As a result, theformed coating of the composition was completely dissolved away in thedeveloper and hence it was impossible to develop the pattern.

1. A negative-working photosensitive siloxane composition, comprising apolysiloxane, a silicon-containing compound having an ureido bond, apolymerization initiator, and a solvent.
 2. The negative-workingphotosensitive siloxane composition according to claim 1, wherein saidpolysiloxane has a weight average molecular weight of 5000 or less. 3.The negative-working photosensitive siloxane composition according toclaim 1, wherein said silicon-containing compound is represented by thefollowing formula (iia) or (iib):


4. The negative-working photosensitive siloxane composition according toclaim 3, wherein said silicon-containing compound is asilicon-containing isocyanurate compound.
 5. The negative-workingphotosensitive siloxane composition according to claim 1, which containssaid polymerization initiator in an amount of 0.001 to 10 weight partsbased on 100 weight parts of said polysiloxane.
 6. The negative-workingphotosensitive siloxane composition according to claim 1, which containssaid silicon-containing compound in an amount of 0.5 to 8.0 weight partsbased on 100 weight parts of said polysiloxane.
 7. The negative-workingphotosensitive siloxane composition according to claim 1, which furthercontains an additive selected from the group consisting of adhesionenhancer, polymerization inhibitor, defoaming agent, surfactant,photosensitizer and stabilizer.
 8. A cured film-manufacturing methodcomprising the steps of: coating on a substrate the negative-workingphotosensitive siloxane composition according to claim 1, to form acoating; exposing the coating to light; and developing the exposedcoating.
 9. The cured film-manufacturing method according to claim 8,which does not comprise a step of heating for curing the coating afterdevelopment.
 10. A cured film formed from the negative-workingphotosensitive siloxane composition according to claim
 1. 11. A devicecomprising the cured film according to claim
 10. 12. Thenegative-working photosensitive siloxane composition according to claim1, wherein the structure of the polysiloxane is selected from the groupconsisting of a silicone structure, a silsesquioxane structure, a silicaskeleton structure and a mixture thereof.
 13. The negative-workingphotosensitive siloxane composition according to claim 1, wherein saidpolysiloxane structure is a mixture of polysiloxane Ia and polysiloxaneIb where the siloxane composition has a dissolution rate in 2.38 wt %tetramethylammonium hydroxide and further where Ia is a polysiloxane,which has a dissolution rate of 3000 Å/second or less in a 5 wt %solution of tetramethylammonium hydroxide and Ib is a polysiloxane whichhas a dissolution rate of 150 Å/second or more and further where theweight ratio of polysiloxanes (1a)/(1b) is between 1/99 to 80/20. 14.The negative photosensitive siloxane composition according to claim 13where the weight ratio of polysiloxanes (1a)/(1b) is between 20/80 to50/50.
 15. The negative photosensitive siloxane composition according toclaim 1 wherein the polysiloxane is a single polysiloxane or a mixtureof polysiloxanes.
 16. The negative photosensitive siloxane compositionaccording to claim 15 wherein the single polysiloxane or mixture ofpolysiloxanes has a weight average molecular weight of 5000 or less. 17.The negative photosensitive siloxane composition according to claim 16where the weight average molecular weight is between 1000 and 4000.